Optimized Lithography-Free Fabrication of Sub-100 nm Nb₂O₅ Nanotube Films as Negative Supercapacitor Electrodes: Tuned Oxygen Vacancies and Cationic Intercalation

Authors

Doha M. Sayed, Energy Materials Laboratory, School of Sciences and Engineering, The American University in Cairo, New Cairo 11835, Egypt,Department of Chemistry, Faculty of Science, Cairo University, Cairo 12613, Egypt
Kholoud E. Salem, Energy Materials Laboratory, School of Sciences and Engineering, The American University in Cairo, New Cairo 11835, Egypt
Nageh K. Allam, Energy Materials Laboratory, School of Sciences and Engineering, The American University in Cairo, New Cairo 11835, Egypt

Author's Department

Energy Materials Laboratory

Second Author's Department

Energy Materials Laboratory

Third Author's Department

Energy Materials Laboratory

Document Type

Research Article

Publication Title

ACS Applied Materials & Interfaces

Publication Date

5-23-2022

doi

10.1021/acsami.2c05320

First Page

25545

Last Page

25555

Recommended Citation

APA Citation

Sayed, D. Salem, K. & Allam, N. (2022). Optimized Lithography-Free Fabrication of Sub-100 nm Nb₂O₅ Nanotube Films as Negative Supercapacitor Electrodes: Tuned Oxygen Vacancies and Cationic Intercalation. ACS Applied Materials & Interfaces, 14, 25545–25555. 10.1021/acsami.2c05320
https://fount.aucegypt.edu/faculty_journal_articles/5744

MLA Citation

Sayed, Doha M., et al. "Optimized Lithography-Free Fabrication of Sub-100 nm Nb₂O₅ Nanotube Films as Negative Supercapacitor Electrodes: Tuned Oxygen Vacancies and Cationic Intercalation." ACS Applied Materials & Interfaces, vol. 14, 2022, pp. 25545–25555.
https://fount.aucegypt.edu/faculty_journal_articles/5744