Selective laser annealing for improved sige MEMS structural layers at 210°C

Selective laser annealing for improved sige MEMS structural layers at 210°C

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Department

Physics Department

Abstract

[abstract not available]

Publication Date

6-1-2010

Document Type

Book Chapter

Book Title

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

ISBN

SCOPUS_ID:77952767994

Publisher

IEEE

City

Hong Kong, China

First Page

324

Last Page

327

Selective laser annealing for improved sige MEMS structural layers at 210°C

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